Semiconductor memory device and memory system

ABSTRACT

The present invention provides a semiconductor memory device and memory system comprising a first semiconductor memory having a first peripheral circuit for transmitting and receiving memory data to/from a first memory cell array, a second semiconductor memory having a second peripheral circuit for transmitting and receiving the memory data to/from a second memory cell array, and a part of the peripheral circuit of the first semiconductor memory formed adjacent to the second memory cell array by a design rule of the second peripheral circuit.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is based upon and claims the benefit of priority fromthe prior Japanese Patent Application No. 2001-045330, filed Feb. 21,2001, the entire contents of which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor memory device and amemory system, and more particularly, it relates to a semiconductormemory device and a memory system using an electrically rewritable andnon-volatile semiconductor memory in combination with an electricallyrewritable and volatile semiconductor memory.

2. Description of the Related Art

Conventionally, there is known an EEPROM (Electrically Erasable andProgrammable Read Only Memory) as one of the semiconductor memories.Special attention has been paid to a NAND-type flash memory using aplurality of memory cells connected in series to constitute a NAND cellblock, as memory capable of high integration.

For the NAND-type flash memory, see the following references: F. Masuokaet al., “New ultra high density EPROM and flash EEPROM with NANDstructured cell”, IEDM Tech. Dig., pp. 552-555, December 1987; J. K. Kimet al., “A 120 mm² 64 Mb NAND flash memory achieving 180 ns/Byteeffective program speed”, IEEE J. Solid-State Circuits, vol. 32, no. 5,pp. 670-680, May 1997.

A memory cell transistor constituting the NAND-type flash memory has anMOS transistor structure in which a floating gate (charge accumulationlayer) and a control gate are stacked one on the other via an insulationfilm on a semiconductor substrate. A plurality of the memory celltransistors are arranged adjacent to each other and connected in seriesso as to share a source and a drain, thereby constituting a NAND-typecell. Such NAND cells are arranged in matrix like layout to therebyconstitute a memory cell array of the NAND-type flash memory.

The NAND-type cells arranged in the column direction of the memory cellarray have one end composed of memory cell transistors having drainseach connected via a select gate transistor to a common bit line, andthe other end composed of memory cell transistors having sources eachconnected via a select gate transistor to a common source line. Controlgates of the memory cell transistors and select gates of the select gatetransistors are connected in the row direction of the cell array as aword line (control gate line) and a select gate line, respectively.

The NAND-type flash memory having the aforementioned configuration hasadvantages that the cell size per one bit is small and the rewrite speedis high as compared to a NOR-type flash memory. On the other hand, theNAND-type flash memory has a disadvantage that access time in randomaccess is 25 μs which is 2 orders or more slower than the NOR-type flashmemory whose access time is 100 ns.

For the NOR-type flash memory, see the following references: F. Masuokaet al., “A new flash E²PROM cell using triple polysilicon technology”,IEDM Tech. Dig., pp. 464-467, December 1984; G. Samachisa et al., “A128K flash EEPROM using double polysilicon technology”, ISSCC Dig. Tech.Papers, pp. 76-77, February 1987; V. N. Kynett et al., “An in-systemreprogrammable 256K CMOS flash memory”, ISSCC Dig. Tech. Papers, pp.132-133, February 1988.

Moreover, in the NAND-type flash memory, 512-byte data items are readout all at once as page data into a page buffer and accordingly, it isrecommended to perform error check correction (hereinafter, referred toas ECC) from an external system out of the chip. Moreover, there is adisadvantage that 16-byte redundant bits per page should be provided onthe chip.

Accordingly, to constitute a semiconductor memory device and memorysystem using the NAND-type flash memory in combination with an SRAM(Static Random Access Memory), a part of a peripheral circuit of theNAND-type flash memory including an ECC circuit and a control circuit ofthe NAND flash memory and an interface circuit interfacing with the highspeed SRAM should be provided as a separate chip.

Especially with the mobile telephone and PDA (Personal DigitalAssistant) market becoming larger and larger every year in all theworld, the flash memory used for mobile telephones and PDAs shouldsignificantly increase its capacity. Demand for the NAND-type flashmemory is increasing because its bit cost is cheap compared to that ofthe NOR-type flash memory.

However, as has been described above, when a part of the peripheralcircuit of the NAND-type flash memory including the ECC circuit and thecontrol circuit dedicated to the NAND-type flash memory and interfacecircuit for the high-speed SRAM is provided on a separate chip, this notonly increases a production cost but also causes a large obstacle whentrying to reduce the size of the mobile telephone and the like.

Ideally speaking, it is preferable that all the peripheral circuits of amemory chip be implemented on a single memory chip. However, theNAND-type flash memory requires voltage as high as about 20V for memorydata rewriting, and for designing a high-voltage transistor, a largedesign rule is applied to the peripheral circuit.

For this, in the semiconductor memory device and memory system using theNAND-type flash memory in combination with the high-speed SRAM, anoverhead area as a redundant area arises in layout when all theperipheral circuits of the NAND-type flash memory are formed on the chipof the NAND-type flash memory.

Moreover, as has been described above, the memory cell transistor of theNAND-type flash memory has a two-layered gate structure in which afloating gate and a control gate are stacked one on the other. Here, ifa MOS transistor having an ordinary one-layered gate structure is usedto constitute a peripheral circuit of the cell array, separate steps arerequired for forming the cell array and the peripheral circuit, whichincreases the production cost.

For this, conventionally, in the NAND-type flash memory productionprocedure, all the MOS transistors including the peripheral circuit areformed to have the two-layered gate structure and in the MOS transistorsconstituting the peripheral circuit, the floating gate and the controlgate are connected to each other and pulled out onto a wiring layer, soas to obtain substantially a one-gate structure.

However, a large area is required for a contact portion for connectingthe floating gate and the control gate and pulling them out onto thewiring layer. Accordingly, if this method is used for all the MOStransistors required for the peripheral circuit structure, it becomesdifficult to reduce the occupation area of the peripheral circuit.

Especially, in the semiconductor memory device and memory system usingthe NAND-type flash memory in combination with the high-speed SRAM, ifall the peripheral circuits related to the NAND-type flash memoryincluding not only a peripheral circuit for operation of the NAND-typeflash memory but also the ECC circuit, the control circuit of theNAND-type flash memory, and the interface circuit for interfacingbetween the NAND-type flash memory and the high-speed SRAM are formed onthe chip of the NAND-type flash memory, the chip size becomesexcessively large.

For this, in spite of causing a large size and a high cost of the mobiletelephone and the like, in the semiconductor memory device and memorysystem using the NAND-type flash memory in combination with thehigh-speed SRAM, a widely used design method is such that a part of theperipheral circuit dedicated to the NAND-type flash memory isimplemented on a separate chip.

It is therefore an aspect of the present invention to provide asemiconductor memory device and memory system using a non-volatilesemiconductor memory consisting of a NAND-type flash memory and the likein combination with a volatile semiconductor memory consisting of ahigh-speed SRAM in which a part of the peripheral circuit dedicated tothe NAND-type flash memory is not formed on a separate chip but providedon the high-speed SRAM, thereby reducing the size of the mobiletelephone and the like.

BRIEF SUMMARY OF THE INVENTION

In the semiconductor memory device and memory system according to thepresent invention using a NAND-type flash memory in combination with ahigh-speed SRAM for a mobile telephone, a memory card, and the like,peripheral circuits dedicated to the NAND-type flash memory such as anECC circuit, a control circuit, and an interface circuit are partiallybuilt into the SRAM chip.

More specifically, the semiconductor memory device and memory systemaccording to the present invention comprise: a first semiconductormemory having a first peripheral circuit for transmitting and receivingmemory data to/from a first memory cell array; a second semiconductormemory having a second peripheral circuit for transmitting and receivingthe memory data to/from a second memory cell array; and a part of acontrol circuit of the first semiconductor memory formed adjacent to thesecond memory cell array according to a design rule of the secondperipheral circuit.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING

FIG. 1 shows a basic configuration of a semiconductor memory device andmemory system according to a first embodiment.

FIG. 2 shows a semiconductor memory device and memory system as astacked assembly on MCP according to a second embodiment.

FIG. 3 shows a memory card configuration assembled side by sideaccording to a third embodiment.

FIG. 4 shows a memory card configuration assembled mixed-stacked andside by side according to a fourth embodiment.

DETAILED DESCRIPTION OF THE INVENTION

Description will now be directed to embodiments of the present inventionwith reference to the attached drawings.

Embodiment 1

FIG. 1 shows a semiconductor memory device and memory system accordingto a first embodiment of the present invention.

The semiconductor memory device and memory system according to the firstembodiment comprises: a non-volatile NAND-type flash memory 1; avolatile RAM 4, and a signal line 8 connecting the NAND-type flashmemory 1 to the RAM 5. Here, the NAND-type flash memory 1 is formed on afirst semiconductor chip and the RAM 4 is formed on a secondsemiconductor chip. Moreover, as the RAM 4, for example, a high-speedSRAM is preferably used. It is also possible to use DRAM (Dynamic RandomAccess Memory) and a pseudo-SRAM.

The first and second semiconductor chips may be stacked one on the otherand sealed or molded into a single package, or it is also possible toseal or mold the first and second semiconductor chips in differentpackages, which are combined when assembled.

Moreover, the first and second semiconductor chips may be arranged sideby side or stacked one on the other on a circuit substrate or may bemounted on different circuit substrates. The first and secondsemiconductor chips sealed or molded in one package are preferably usedas a component of the semiconductor memory device or memory system. Thefirst and second semiconductor chips mounted on a single circuitsubstrate are preferably used as a semiconductor memory system.

The NAND-type flash memory 1 is composed of a memory cell array 2 and aperipheral circuit 3 required for transmitting and receiving memory datato/from the memory cell array 2. This peripheral circuit 3 comprises acontrol circuit for operating the NAND-type flash memory; a voltageboost circuit for generating a write voltage, read voltage, and erasevoltage; a page buffer circuit for reading and writing the memory datafrom/to a memory cell; a column decoder; a row decoder; and the like.

Furthermore, the RAM 4 comprises a memory cell array 5; a peripheralcircuit 6 for transmitting and receiving the memory data to/from thememory cell array 5; and a part of peripheral circuit (peripheralcircuit 7 in FIG. 1) dedicated to the NAND-type flash memory 1. Theperipheral circuit 7 comprises an ECC circuit of the NAND-type flashmemory 1; an interface circuit for interfacing between the NAND-typeflash memory 1 and the RAM 4; and a part of the control circuit foroperating the NAND-type flash memory 1.

In the NAND-type flash memory, a flag is set (flag is written into anon-volatile memory) in a redundant portion of a failed block in thememory cell array and this flag is read out when power is turned on, sothat data access is not performed to the failed block. This control isalso included as a part of the control circuit for operating theNAND-type flash memory 1.

Additionally, when this memory system is used as a memory card, acontrol circuit dedicated to the card is required. Moreover, in case ofa silicon disc to replace a hard disc, a control circuit dedicated tothe silicon disc is required. These control circuits are also built inthe RAM chip used in combination with the NAND-type flash memory.Moreover, the NAND-type flash memory 1 and the RAM 4 are connected toeach other using a signal line 8. The signal line 8 includes a controlsignal line, an address line, I/O line, and the like.

As has been described above, in the semiconductor memory device andmemory system according to the first embodiment, only the circuitindispensable for transmitting and receiving data to/from the memorycell array is mounted on the peripheral circuit 3 of the NAND-type flashmemory 1 while a part of the peripheral circuit dedicated to theNAND-type flash memory 1 required for constituting the memory systemusing the NAND-type flash memory 1 and the RAM 4 as components is formedin the peripheral circuit 7 on the chip of RAM 4.

This configuration eliminates the necessity of a large-size transistorsuch as a voltage boost circuit on the chip of the RAM 4. Accordingly,by designing the peripheral circuit 7 by using a design rule similar toa peripheral circuit 6 of the RAM 4, it is possible to shrink theoverhead area in the layout.

Moreover, since there is no need of process matching with the NAND-typeflash memory 1 (the two-layered gate structure), it is possible to use aMOS transistor of single-layered gate structure with a high integrationdensity on the chip of the RAM 4 without arranging the peripheralcircuit 7 on a separate chip.

It should be noted that the first embodiment has been explained for acase that the NAND-type flash memory and the RAM are formed as differentchips, so as to serve as components of the semiconductor memory deviceand memory system at the stage of multi-chip assembling. However, thepresent invention is not limited to the multi-chip assembly.

Even when the NAND-type flash memory and the RAM are formed on a singlechip, a layout advantage can be obtained as a whole by forming a part ofthe peripheral circuit dedicated to the NAND-type flash memory adjacentto the RAM cell array using the design rule of the RAM peripheralcircuit and forming only the peripheral circuit indispensable for datatransmitting and receiving to/from the NAND cell array in the NAND-typeflash memory layout region.

Embodiment 2

Next, explanation will be given on a second embodiment with reference toFIG. 2.

In the semiconductor memory device and memory system according to thesecond embodiment, the chip of the NAND-type flash memory and the chipof the RAM are stacked one on the other and sealed or molded into asingle package so as to constitute a multi-chip-package (hereinafter,referred to as MCP).

FIG. 2 shows the MCP composed of the NAND-type flash memory and the RAMaccording to the second embodiment. In the MCP 10, the NAND-type flashmemory 11 and the RAM 14 are separate chips stacked within a singlepackage.

On the chip of the NAND-type flash memory 11, there are formed a memorycell array 12 and a peripheral circuit 13 for transmitting and receivingmemory information to/from the memory cell array 12 while on the chip ofthe RAM 14, there are formed a memory cell array 15, a peripheralcircuit 16 for transmitting and receiving memory information to/from thememory cell array 15, and a part of peripheral circuit dedicated to theNAND-type flash memory 11 (peripheral circuit 17).

It should be noted that in FIG. 2, a wiring connecting the NAND-typeflash memory 11 to the RAM 14, a signal line, and external terminals ofthe MCP are omitted.

When the MCP is composed of two chips, i.e., the chip of the NAND-typeflash memory and the chip of the RAM are stacked one on the other, it ispossible to significantly reduce the MCP assembly area. Moreover, bymatching the arrangement of pads between the two chips, it is possibleto reduce length of the wiring connecting the two chips and length ofthe signal line, thereby enhancing the integration density and operationspeed of the semiconductor memory device and memory system composed ofthe MCP.

Embodiment 3

Next, explanation will be given on a third embodiment with reference toFIG. 3.

In the third embodiment, explanation will be given on configuration of amemory card in which the NAND-type flash memory chip and the RAM chipare arranged side by side and sealed or molded in a single package.

FIG. 3 shows configuration of the memory card composed of the NAND-typeflash memory and the RAM according to the third embodiment.

In the memory card 20, two chips, i.e., a chip of the NAND-type flashmemory 21 and a chip of the RAM 24 are arranged side by side. On thechip of the NAND-type flash memory 21, there are formed a memory cellarray 22 and a peripheral circuit 23 for transmitting and receivingmemory information to/from the memory cell array 22 while on the chip ofthe RAM 24, there are formed a memory cell array 25, a peripheralcircuit 26 for transmitting and receiving memory information to/from thememory cell array 25, and a part of a peripheral circuit dedicated tothe NAND-type flash memory 21 (peripheral circuit 27).

The peripheral circuit 27 may include in addition to the part of theperipheral circuit dedicated to the NAND-type flash memory 21, a controlcircuit of the memory card itself. The control circuit of the memorycard itself varies depending on the card type: a compact flash card (CFcard), a secure digital card (SD card), a memory stick card, a multimedia card (MMC card), and the like. It should be noted that in thefigure, a wiring connecting the NAND-type flash memory 21 to the RAM 24,a signal line, external terminals of the memory card are omitted.

Thus, when the two chips, i.e., the NAND-type flash memory chip and theRAM chip are arranged side by side, it is possible to sufficientlyreduce thickness of the MCP so as to serve as a memory card. It shouldbe noted that by using a layout that the peripheral circuit and controlcircuit are arranged to face each other between the two chips andmatching the pad arrangement, it is possible to reduce the length of thewiring connecting the two chips and the length of a signal line, whichin turn increases the memory card integration density and operationspeed.

Embodiment 4

Next, explanation will be given on a fourth embodiment with reference toFIG. 4.

As the fourth embodiment, explanation will be given on a memory card inwhich two chips of NAND-type flash memory are stacked one on the other,which are arranged at a side of the RAM chip to be used in combination,and the three chips are sealed or molded in a single package.

As shown in FIG. 4, the memory card according to the fourth embodimentincludes NAND-type flash memories 31 a and 31 b composed of two chipsand one chip of a RAM 34 having a part of peripheral circuit of theNAND-type flash memories 31 a and 31 b as a built-in circuit (peripheralcircuit 37). The NAND-type flash memory chips and the RAM chip haveidentical configuration as in the first to third embodiment andidentical components are denoted by corresponding reference numbers,omitting their detailed explanation.

Thus, when the two chips of the NAND-type flash memories are stacked oneon the other and one RAM chip is arranged at a side of the two chips soas to constitute the MCP, it is possible to significantly increase thememory capacity of the NAND-type flash memory to be combined with theRAM while using a chip occupation area identical to that of the thirdembodiment.

As has been explained in the second and the third embodiment, bymatching the chip arrangement with the pad arrangement on the chips, itis possible to reduce the length of wiring connecting chips and thelength of a signal line, thereby increasing the integration density andoperation speed of the semiconductor memory device and memory system.

It should be noted that in the fourth embodiment, explanation has beengiven on an example combining two chips of the NAND-type flash memorieswith the one-chip RAM. However, the second to the fourth embodimentinclude a case when n (n is a natural number) chips of the NAND-typeflash memories are combined with m (m is a natural number not greaterthan n) chips of the RAM.

Embodiment 5

Next, explanation will be given on a fifth embodiment of the presentinvention. In the fifth embodiment, chip size comparison is performedbetween a case when a part of the peripheral circuit dedicated to theNAND-type flash memory explained in the first to fourth embodiment isbuilt into the NAND-type flash memory chip and a case when the part ofthe peripheral circuit is built into the RAM chip.

It should be noted that, here, explanation will be given on a case whena pseudo-SRAM is used as the RAM.

When the design rule is 0.13 μm, a 1-giga bit NAND-type flash memory hasa chip size calculated to be about 130 mm². When this chip has abuilt-in part of the peripheral circuit dedicated to the NAND-type flashmemory, the chip size increases by about 25 mm².

In contrast to this, when a pseudo-SRAM chip of design rule of 0.13 μmhas the built-in part of the peripheral circuit dedicated to theNAND-type flash memory, the chip size increases only by 2 mm². Theentire chip size of the pseudo-SRAM varies depending on the memorycapacity, but the increased portion does not reach 10% of the chip size.

Thus, there is a great difference in chip size increase between theNAND-type flash memory and the pseudo-SRAM because in the case of theNAND-type flash memory, the design rule of 0.13 μm is a design rule ofthe memory cell array and a design rule of the peripheral circuit ismultiplied by about 10 because of the reason explained in the prior art.

As has been described above, by building the part of the peripheralcircuit dedicated to the NAND-type flash memory in the RAM chip to becombined with, it is possible to significantly reduce the overhead area,thereby enabling to provide a semiconductor memory device and memorysystem having a high integration density at a low cost. As a result, itis possible to provide a new product such as a mobile telephone and PDAhaving a smaller size and a smaller weight at a low cost.

In the fifth embodiment, the chip size increase has been calculated forthe pseudo-SRAM chip having a large memory capacity as the RAM chip tobe combined with the NAND-type flash memory. Identical results can beobtained when a high-speed SRAM or DRAM chip is used as the RAM chip.

It should be noted that the present invention is not to be limited tothe aforementioned embodiments. For example, in the first to the fifthembodiment, the NAND-type flash memory having a large memory capacity asa non-volatile semiconductor memory to be combined with the RAM chipmade from volatile memory cells may be replaced by other types of flashmemory.

The semiconductor memory device and its system according to the presentinvention can also be constituted by using a non-volatile memory chipsuch an AND-type, NOR-type, or DINOR-type flash memory in combinationwith the RAM chip made from volatile memory cells. For the AND-type, orDINOR-type flash memory, see the following citations.

AND-type; H. Kume et al, “A 1.28 μm² contactless memory cell technologyfor 3V only 64 Mbit EEPROM”, al., “A 140 mm² 64 Mb AND flash memory witha 0.4 μm technology”, ISSCC Dig. Tech. Papers, pp. 34-35, February 1996.

DINOR-type; H. Onoda et al., “A novel cell structure suitable for a 3volt operation, sector erase flash memory”, IEDM Tech. Dig., pp.599-602, December 1992; S. Kobayashi et al., “A 3.3V only 16 Mb DINORflash memory”, ISSCC Dig. Tech. Papers, pp. 122-123, February 1995.

For example, when the present invention is applied to a combination ofthe NOR-type flash memory chip with the high-speed SRAM chip, it ispossible to provide a semiconductor device and memory system having ahigh speed, low power consumption, and a high integration densityalthough the memory capacity is small.

Moreover, when a plurality of NAND-type flash memory chips are used incombination with a pseudo-SRAM chip having a built-in part of theperipheral circuit dedicated to the NAND-type flash memories, it ispossible to obtain a remarkably large memory capacity, although powerconsumption is increased. This combination can preferably be used for asystem other than the memory card such as a silicon disc and the like.

It should be noted that when the present invention is applied, a part ofthe peripheral circuit dedicated to the non-volatile semiconductormemory should be built into a volatile semiconductor memory chip. Acontrol circuit contained in a part of the peripheral circuit differsdepending on a subject system and accordingly, the semiconductor memorydevice and memory system of the present invention cannot be constitutedby using a general purpose volatile RAM chip as it is.

However, the control circuit contained in a part of the peripheralcircuit required for application of the present invention is small incircuit size and it is possible to easily provide a chip correspondingto the system without increase of cost due to design modification byapplying the CAD, or the like. Especially in the field of mobiletelephones or memory cards, a production amount is quite large per onetype and even if a chip is developed corresponding to the system, thereis no danger of disadvantage caused by multi-type small-amountproduction.

It should be noted that the semiconductor memory device and memorysystem of the present invention have been explained on a case when anon-volatile semiconductor memory is used in combination with a volatilesemiconductor memory, but the present invention is not limited to such acase.

For example, there is a case that integration density is increased byusing a first and a second semiconductor memory which are both volatilesemiconductor memories formed on different chips and forming a part ofperipheral circuit dedicated to the first semiconductor memory on thesecond semiconductor memory. Thus, the present invention can be modifiedin various ways without departing from the scope of the presentinvention.

As has been described above, according to the present invention, a partof the peripheral circuit dedicated to the non-volatile semiconductormemory is formed not on a separate chip but on the volatilesemiconductor memory chip used in combination, thereby enabling toprovide the semiconductor memory device and memory system capable ofreducing size of a mobile telephone, a memory card, and the like with ahigh integration density at a low cost. Moreover, when the combinationof the non-volatile semiconductor memory chip and the volatilesemiconductor memory chip is mounted on the MCP, it is possible toachieve a further cheaper and smaller semiconductor memory device andmemory system.

Additional advantages and modifications will readily occur to thoseskilled in the art. Therefore, the invention in its broader aspects isnot limited to the specific details and representative embodiments shownand described herein. Accordingly, various modifications may be madewithout departing from the spirit or scope of the general inventionconcept as defined by the appended claims and their equivalents.

What is claimed is:
 1. A semiconductor memory device comprising: a firstsemiconductor memory having a first peripheral circuit which transmitsand receives memory data to/from a first memory cell array; a secondsemiconductor memory having a second peripheral circuit which transmitsand receives the memory data to/from a second memory cell array; and apart of the peripheral circuit of the first semiconductor memory formedadjacent to the second memory cell array by a design rule of the secondperipheral circuit.
 2. The semiconductor memory device according toclaim 1, wherein the part of the peripheral circuit includes an errordetection/correction circuit for the first semiconductor memory.
 3. Thesemiconductor memory device according to claim 1, wherein the part ofthe peripheral circuit includes a part of a control circuit of the firstsemiconductor memory.
 4. The semiconductor memory device according toclaim 1, wherein the part of the peripheral circuit includes aninterface circuit between the first and second semiconductor memories.5. The semiconductor memory device according to claim 1, wherein thefirst semiconductor memory is an electrically rewritable andnon-volatile semiconductor memory, and the second semiconductor memoryis an electrically rewritable and volatile semiconductor memory.
 6. Thesemiconductor memory device according to claim 5, wherein theelectrically rewritable and non-volatile semiconductor memory is atleast one selected from a group consisting of a NAND-type flash memory,an AND-type flash memory, a DINOR-type flash memory, and a NOR-typeflash memory.
 7. The semiconductor memory device according to claim 5,wherein the electrically rewritable and volatile semiconductor memory isat least one selected from a group consisting of an SRAM, a pseudo-SRAM,and a DRAM.
 8. A semiconductor memory system comprising: a firstsemiconductor memory chip having a first peripheral circuit whichtransmits and receives memory data to/from a first memory cell array; asecond semiconductor memory chip having a second peripheral circuitwhich transmits and receives the memory data to/from a second memorycell array; and a part of the peripheral circuit of the firstsemiconductor memory chip formed adjacent to the second memory cellarray on the second semiconductor memory chip by a design rule of thesecond peripheral circuit.
 9. The semiconductor memory system accordingto claim 8, wherein the first and second semiconductor memory chips arestacked one on the other.
 10. The semiconductor memory system accordingto claim 8, wherein the first and second semiconductor memory chips arearranged side by side.
 11. The semiconductor memory system according toclaim 8, wherein the part of the peripheral circuit includes an errordetection/correction circuit for the first semiconductor memory chip.12. The semiconductor memory system according to claim 8, wherein thepart of the peripheral circuit includes a part of a control circuit ofthe first semiconductor memory chip.
 13. The semiconductor memory systemaccording to claim 8, wherein the part of the peripheral circuitincludes an interface circuit between the first and second semiconductormemory chips.
 14. The semiconductor memory system according to claim 8,wherein the first semiconductor memory chip is an electricallyrewritable and non-volatile semiconductor memory chip, and the secondsemiconductor memory chip is an electrically rewritable and volatilesemiconductor memory chip.
 15. The semiconductor memory system accordingto claim 14, wherein the electrically rewritable and non-volatilesemiconductor memory chip is at least one selected from a groupconsisting of a NAND-type flash memory chip, an AND-type flash memorychip, a DINOR-type flash memory chip, and a NOR-type flash memory chip.16. The semiconductor memory system according to claim 14, wherein theelectrically rewritable and volatile semiconductor memory chip is atleast one selected from a group consisting of an SRAM chip, apseudo-SRAM chip, and a DRAM chip.
 17. A semiconductor memory systemcomprising: n (n is a natural number equal to or more than 1) firstsemiconductor memory chip/chips having a first peripheral circuit whichtransmits and receives memory data to/from a first memory cell array; m(m is a natural number not greater than n) second semiconductor memorychip/chips having a second peripheral circuit which transmits andreceives the memory data to/from a second memory cell array; and a partof the peripheral circuit of the first semiconductor memory chip formedadjacent to the second memory cell array on the second semiconductormemory chip by a design rule of the second peripheral circuit.
 18. Thesemiconductor memory system according to claim 17, wherein the first andsecond semiconductor memory chips are stacked one on the other.
 19. Thesemiconductor memory system according to claim 17, wherein the first andsecond semiconductor memory chips are arranged side by side.
 20. Thesemiconductor memory system according to claim 17, wherein the part ofthe peripheral circuit includes an error detection/correction circuitfor the first semiconductor memory chip.
 21. The semiconductor memorysystem according to claim 17, wherein the part of the peripheral circuitincludes a part of a control circuit of the first semiconductor memorychip.
 22. The semiconductor memory system according to claim 17, whereinthe part of the peripheral circuit includes an interface circuit betweenthe first and second semiconductor memory chips.
 23. The semiconductormemory system according to claim 17, wherein the first semiconductormemory chip is an electrically rewritable and non-volatile semiconductormemory chip, and the second semiconductor memory chip is an electricallyrewritable and volatile semiconductor memory chip.
 24. The semiconductormemory system according to claim 23, wherein the electrically rewritableand non-volatile semiconductor memory chip is at least one selected froma group consisting of a NAND-type flash memory chip, an AND-type flashmemory chip, a DINOR-type flash memory chip, and a NOR-type flash memorychip.
 25. The semiconductor memory system according to claim 23, whereinthe electrically rewritable and volatile semiconductor memory chip is atleast one selected from a group consisting of an SRAM chip, apseudo-SRAM chip, and a DRAM chip.